The HEMT device has a body including a heterostructure configured to generate a 2-dimensional charge-carrier gas; and a gate structure which extends on a top surface of the body and is biasable to electrically control the 2-dimensional charge-carrier gas. The gate structure has a channel modulating region of semiconductor material; a functional region of semiconductor material; and a gate contact region of conductive material. The functional region and the gate contact region extend on a top surface of the channel modulating region and the gate contact region is arranged laterally with respect to the functional region. The channel modulating region has a different conductivity type with respect to the functional region.

Hemt device having an improved gate structure and manufacturing process thereof / Iucolano, Ferdinando; Chini, Alessandro; Eloisa Castagna, Maria; Constant, Aurore; Tringali, Cristina. - (2024 Mar 21).

Hemt device having an improved gate structure and manufacturing process thereof

Alessandro Chini;
2024

Abstract

The HEMT device has a body including a heterostructure configured to generate a 2-dimensional charge-carrier gas; and a gate structure which extends on a top surface of the body and is biasable to electrically control the 2-dimensional charge-carrier gas. The gate structure has a channel modulating region of semiconductor material; a functional region of semiconductor material; and a gate contact region of conductive material. The functional region and the gate contact region extend on a top surface of the channel modulating region and the gate contact region is arranged laterally with respect to the functional region. The channel modulating region has a different conductivity type with respect to the functional region.
21-mar-2024
STMicroelectronics SRL
US20240332413A1
Iucolano, Ferdinando; Chini, Alessandro; Eloisa Castagna, Maria; Constant, Aurore; Tringali, Cristina
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11380/1400046
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