In this work, simulations and experimental characterizations of normally-off p-type gate GaN-based HEMTs for switching power applications are reported and analyzed, in order to get more accurate understanding of the underlying physical mechanisms resulting in the macroscopic behavior of devices under test. In particular, the first portion of the thesis deals with the main properties characterizing Gallium Nitride and the discussion about the relevance of studying GaN-based devices and their behavior. On the second part, the focus is posed on 100V p-GaN HEMTs and the role of magnesium doping is deeply investigated through TCAD simulations and experiments. Indeed, p-doping of the gate module is obtained through magnesium doping, but the effect of its level and its electrical activation is of great relevance to fully comprehend the device performances both in off and on states. To this purpose, chemical analyses of some samples are also presented since their results are key to integrate the understanding obtained from simulated and experimentally measured electrical data. Another important topic that is discussed in the following chapter is the study of on-resistance at high temperature both in static and dynamic conditions. In fact, when switching devices are working in power applications at high frequencies, they suffer both from conduction and switching losses that lead to self-heating of the device itself. Therefore, the accurate analysis of the factors that can influence the temperature behavior of the on-resistance (which is one of the main figures of merit) is crucial to the improvement of the actual high-temperature performances of p-GaN HEMTs during application conditions. Different solutions are proposed in order to reduce the de-rating of the RON at high temperatures, and it is proved that, at steady state, the relative dynamic increase of the on-resistance induced by high drain voltage is insensitive to temperature, in the case of single buffer-related degradation mechanisms like carbon-induced hole redistribution. In the last two chapters, the focus is shifted towards 650 V rated p-GaN HEMTs. In particular, the drain and gate reliability of these devices are investigated: at first, TCAD simulations are exploited to understand experimental results coming from drain reliability tests performed on different families of devices; then, a gate screening procedure for the preliminary evaluation of the gate robustness is presented and applied to p-GaN HEMTs with different fabrication process flows, showing advantages and drawbacks. Finally, two-gate devices, namely bidirectional p-GaN HEMTs are presented and DC/AC TCAD simulations on these devices are performed and described. Then, the simulated data are compared to experimental measurements, showing also the comparison with the results obtained on one-gate unidirectional p-GaN HEMTs.
In questo lavoro, vengono riportate e analizzate simulazioni e caratterizzazioni sperimentali di HEMT basati su GaN con gate di tipo p (normally-off) per applicazioni di potenza a commutazione, al fine di ottenere una comprensione più accurata dei meccanismi fisici sottostanti che determinano il comportamento macroscopico dei dispositivi in esame. In particolare, la prima parte della tesi tratta le principali proprietà che caratterizzano il Nitruro di Gallio e discute la rilevanza dello studio dei dispositivi basati su GaN e del loro comportamento. Nella seconda parte, l'attenzione si concentra su p-GaN HEMTs da 100V e il ruolo del drogaggio di magnesio viene approfondito attraverso simulazioni TCAD ed esperimenti. Infatti, il drogaggio di tipo p del modulo di gate viene ottenuto tramite magnesio, ma l'effetto della sua quantità e della sua attivazione elettrica è di grande importanza per comprendere appieno le prestazioni del dispositivo sia nello stato off che in quello on. A questo scopo, vengono presentate anche analisi chimiche di alcuni campioni, poiché i loro risultati sono fondamentali per integrare la comprensione ottenuta dai dati elettrici simulati e misurati sperimentalmente. Un altro argomento importante discusso nel capitolo successivo è lo studio della on-resistance ad alta temperatura, sia in condizioni statiche che dinamiche. Infatti, quando i dispositivi di commutazione operano in applicazioni di potenza ad alte frequenze, risentono sia delle perdite di conduzione che di commutazione, che portano all'auto-riscaldamento del dispositivo stesso. Pertanto, l'analisi accurata dei fattori che possono influenzare il comportamento in temperatura della on-resistance (che è una delle principali figure di merito) è cruciale per il miglioramento delle effettive prestazioni ad alta temperatura dei p-GaN HEMTs durante le condizioni applicative. Vengono proposte diverse soluzioni per ridurre il de-rating della Ron ad alte temperature, e viene dimostrato che, a regime, l'aumento dinamico relativo della on-resistance indotto da un'elevata tensione di drain è invariante rispetto alla temperatura nell’ipotesi di singolo meccanismo di degrado legato al buffer, come la ridistribuzione delle lacune indotta dal carbonio. Negli ultimi due capitoli, l'attenzione si sposta verso i p-GaN HEMT con tensione nominale di 650 V. In particolare, viene studiata l'affidabilità di drain e di gate di questi dispositivi: inizialmente, si sfruttano le simulazioni TCAD per comprendere i risultati sperimentali derivanti dai test di affidabilità del drain eseguiti su diverse famiglie di dispositivi; successivamente, viene presentata e applicata una procedura di screening sul gate per la valutazione preliminare della robustezza del gate su p-GaN HEMTs con diversi flussi di processo di fabbricazione, mostrandone vantaggi e svantaggi. Infine, vengono presentati dispositivi a doppio gate, ovvero p-GaN HEMT bidirezionali, sui quali vengono eseguite e descritte simulazioni TCAD in DC/AC. I dati simulati vengono poi confrontati con misure sperimentali, includendo anche il confronto con i risultati ottenuti su p-GaN HEMT unidirezionali a gate singolo.
Caratterizzazione e simulazioni TCAD di dispositivi di potenza in nitruro di gallio / Giovanni Giorgino , 2026 Apr 20. 38. ciclo, Anno Accademico 2024/2025.
Caratterizzazione e simulazioni TCAD di dispositivi di potenza in nitruro di gallio
GIORGINO, GIOVANNI
2026
Abstract
In this work, simulations and experimental characterizations of normally-off p-type gate GaN-based HEMTs for switching power applications are reported and analyzed, in order to get more accurate understanding of the underlying physical mechanisms resulting in the macroscopic behavior of devices under test. In particular, the first portion of the thesis deals with the main properties characterizing Gallium Nitride and the discussion about the relevance of studying GaN-based devices and their behavior. On the second part, the focus is posed on 100V p-GaN HEMTs and the role of magnesium doping is deeply investigated through TCAD simulations and experiments. Indeed, p-doping of the gate module is obtained through magnesium doping, but the effect of its level and its electrical activation is of great relevance to fully comprehend the device performances both in off and on states. To this purpose, chemical analyses of some samples are also presented since their results are key to integrate the understanding obtained from simulated and experimentally measured electrical data. Another important topic that is discussed in the following chapter is the study of on-resistance at high temperature both in static and dynamic conditions. In fact, when switching devices are working in power applications at high frequencies, they suffer both from conduction and switching losses that lead to self-heating of the device itself. Therefore, the accurate analysis of the factors that can influence the temperature behavior of the on-resistance (which is one of the main figures of merit) is crucial to the improvement of the actual high-temperature performances of p-GaN HEMTs during application conditions. Different solutions are proposed in order to reduce the de-rating of the RON at high temperatures, and it is proved that, at steady state, the relative dynamic increase of the on-resistance induced by high drain voltage is insensitive to temperature, in the case of single buffer-related degradation mechanisms like carbon-induced hole redistribution. In the last two chapters, the focus is shifted towards 650 V rated p-GaN HEMTs. In particular, the drain and gate reliability of these devices are investigated: at first, TCAD simulations are exploited to understand experimental results coming from drain reliability tests performed on different families of devices; then, a gate screening procedure for the preliminary evaluation of the gate robustness is presented and applied to p-GaN HEMTs with different fabrication process flows, showing advantages and drawbacks. Finally, two-gate devices, namely bidirectional p-GaN HEMTs are presented and DC/AC TCAD simulations on these devices are performed and described. Then, the simulated data are compared to experimental measurements, showing also the comparison with the results obtained on one-gate unidirectional p-GaN HEMTs.| File | Dimensione | Formato | |
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